Graphene growth by molecular beam epitaxy on the carbon-face of SiC

Graphene layers have been grown by molecular beam epitaxy (MBE) on the ( 000 1 ¯ ) C-face of SiC and have been characterized by atomic force microscopy, low energy electron diffraction (LEED), and UV photoelectron spectroscopy. Contrary to the graphitization process, the step-terrace structure of Si...

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Veröffentlicht in:Applied physics letters 2010-12, Vol.97 (24), p.241907-241907-3
Hauptverfasser: Moreau, E., Godey, S., Ferrer, F. J., Vignaud, D., Wallart, X., Avila, J., Asensio, M. C., Bournel, F., Gallet, J.-J.
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Sprache:eng
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Zusammenfassung:Graphene layers have been grown by molecular beam epitaxy (MBE) on the ( 000 1 ¯ ) C-face of SiC and have been characterized by atomic force microscopy, low energy electron diffraction (LEED), and UV photoelectron spectroscopy. Contrary to the graphitization process, the step-terrace structure of SiC is fully preserved during the MBE growth. LEED patterns show multiple orientation domains which are characteristic of graphene on SiC ( 000 1 ¯ ) , indicating non-Bernal rotated graphene planes. Well-defined Dirac cones, typical of single-layer graphene, have been observed in the valence band for few graphene layers by synchrotron spectroscopy, confirming the electronic decoupling of graphene layers.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3526720