X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma
A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (...
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| creator | Chan, L. S. Ghomeishi, M. Yap, S. L. Wong, C. S. |
| description | A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (measured by PIN diode) and extreme ultraviolet, EUV (measured by SXUV5A with integrated filter) can be measured simultaneously when good pinching discharge as indicated by sharp dip in the waveform of the rate of current is achieved. For discharge with mild pinching, only EUV emission is observed. |
| doi_str_mv | 10.1063/1.3469706 |
| format | Conference Proceeding |
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S. ; Ghomeishi, M. ; Yap, S. L. ; Wong, C. S.</creator><creatorcontrib>Chan, L. S. ; Ghomeishi, M. ; Yap, S. L. ; Wong, C. S.</creatorcontrib><description>A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (measured by PIN diode) and extreme ultraviolet, EUV (measured by SXUV5A with integrated filter) can be measured simultaneously when good pinching discharge as indicated by sharp dip in the waveform of the rate of current is achieved. For discharge with mild pinching, only EUV emission is observed.</description><identifier>ISSN: 0094-243X</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/1.3469706</identifier><language>eng</language><publisher>United States</publisher><subject>ABLATION ; ANODES ; COPPER ; CURRENTS ; ELECTRIC POTENTIAL ; ELECTRODES ; ELECTROMAGNETIC RADIATION ; ELEMENTS ; EMISSION ; EXTREME ULTRAVIOLET RADIATION ; FILTERS ; FLUIDS ; INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY ; IONIZING RADIATIONS ; LASERS ; LIQUIDS ; METALS ; NATURAL GAS LIQUIDS ; PHOTODIODES ; PLASMA ; RADIATION SOURCES ; RADIATIONS ; SEMICONDUCTOR DEVICES ; SEMICONDUCTOR DIODES ; TRANSITION ELEMENTS ; ULTRAVIOLET RADIATION ; WAVE FORMS ; X RADIATION ; X-RAY LASERS</subject><ispartof>AIP conference proceedings, 2010, Vol.1250 (1)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,27903,27904</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/21410550$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Chan, L. S.</creatorcontrib><creatorcontrib>Ghomeishi, M.</creatorcontrib><creatorcontrib>Yap, S. L.</creatorcontrib><creatorcontrib>Wong, C. S.</creatorcontrib><title>X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma</title><title>AIP conference proceedings</title><description>A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (measured by PIN diode) and extreme ultraviolet, EUV (measured by SXUV5A with integrated filter) can be measured simultaneously when good pinching discharge as indicated by sharp dip in the waveform of the rate of current is achieved. For discharge with mild pinching, only EUV emission is observed.</description><subject>ABLATION</subject><subject>ANODES</subject><subject>COPPER</subject><subject>CURRENTS</subject><subject>ELECTRIC POTENTIAL</subject><subject>ELECTRODES</subject><subject>ELECTROMAGNETIC RADIATION</subject><subject>ELEMENTS</subject><subject>EMISSION</subject><subject>EXTREME ULTRAVIOLET RADIATION</subject><subject>FILTERS</subject><subject>FLUIDS</subject><subject>INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY</subject><subject>IONIZING RADIATIONS</subject><subject>LASERS</subject><subject>LIQUIDS</subject><subject>METALS</subject><subject>NATURAL GAS LIQUIDS</subject><subject>PHOTODIODES</subject><subject>PLASMA</subject><subject>RADIATION SOURCES</subject><subject>RADIATIONS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SEMICONDUCTOR DIODES</subject><subject>TRANSITION ELEMENTS</subject><subject>ULTRAVIOLET RADIATION</subject><subject>WAVE FORMS</subject><subject>X RADIATION</subject><subject>X-RAY LASERS</subject><issn>0094-243X</issn><issn>1551-7616</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2010</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotzMtKxDAUANAgCtbRhX8QcJ3x3rwDbqTUBwwojDPMbkjTBKvTB0278O9d6OrsDiG3CGsELe5xLaR2BvQZKVApZEajPicFgJOMS3G4JFc5fwFwZ4wtyMOBTf6H-r6h1W5Pq67NuR16up2Xpo2ZDomWwzjGie59WJaObkc_fdP3k8-dvyYXyZ9yvPl3RXZP1Uf5wjZvz6_l44YNaMXMjE21sC4lYetkALkP1iIC1tgYxZtowHlfRxC10knGZKXiKXInghQca7Eid3_vkOf2mEM7x_AZhr6PYT5ylAhKgfgFNoNHKw</recordid><startdate>20100101</startdate><enddate>20100101</enddate><creator>Chan, L. S.</creator><creator>Ghomeishi, M.</creator><creator>Yap, S. L.</creator><creator>Wong, C. S.</creator><scope>OTOTI</scope></search><sort><creationdate>20100101</creationdate><title>X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma</title><author>Chan, L. S. ; Ghomeishi, M. ; Yap, S. L. ; Wong, C. S.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o183t-78fb389ff38bf7012ac881101b1d752de709aabe03b56f4ef8452fe293c4321b3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2010</creationdate><topic>ABLATION</topic><topic>ANODES</topic><topic>COPPER</topic><topic>CURRENTS</topic><topic>ELECTRIC POTENTIAL</topic><topic>ELECTRODES</topic><topic>ELECTROMAGNETIC RADIATION</topic><topic>ELEMENTS</topic><topic>EMISSION</topic><topic>EXTREME ULTRAVIOLET RADIATION</topic><topic>FILTERS</topic><topic>FLUIDS</topic><topic>INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY</topic><topic>IONIZING RADIATIONS</topic><topic>LASERS</topic><topic>LIQUIDS</topic><topic>METALS</topic><topic>NATURAL GAS LIQUIDS</topic><topic>PHOTODIODES</topic><topic>PLASMA</topic><topic>RADIATION SOURCES</topic><topic>RADIATIONS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SEMICONDUCTOR DIODES</topic><topic>TRANSITION ELEMENTS</topic><topic>ULTRAVIOLET RADIATION</topic><topic>WAVE FORMS</topic><topic>X RADIATION</topic><topic>X-RAY LASERS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chan, L. S.</creatorcontrib><creatorcontrib>Ghomeishi, M.</creatorcontrib><creatorcontrib>Yap, S. L.</creatorcontrib><creatorcontrib>Wong, C. S.</creatorcontrib><collection>OSTI.GOV</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chan, L. S.</au><au>Ghomeishi, M.</au><au>Yap, S. L.</au><au>Wong, C. S.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma</atitle><btitle>AIP conference proceedings</btitle><date>2010-01-01</date><risdate>2010</risdate><volume>1250</volume><issue>1</issue><issn>0094-243X</issn><eissn>1551-7616</eissn><abstract>A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (measured by PIN diode) and extreme ultraviolet, EUV (measured by SXUV5A with integrated filter) can be measured simultaneously when good pinching discharge as indicated by sharp dip in the waveform of the rate of current is achieved. For discharge with mild pinching, only EUV emission is observed.</abstract><cop>United States</cop><doi>10.1063/1.3469706</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0094-243X |
| ispartof | AIP conference proceedings, 2010, Vol.1250 (1) |
| issn | 0094-243X 1551-7616 |
| language | eng |
| recordid | cdi_osti_scitechconnect_21410550 |
| source | AIP Journals Complete |
| subjects | ABLATION ANODES COPPER CURRENTS ELECTRIC POTENTIAL ELECTRODES ELECTROMAGNETIC RADIATION ELEMENTS EMISSION EXTREME ULTRAVIOLET RADIATION FILTERS FLUIDS INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY IONIZING RADIATIONS LASERS LIQUIDS METALS NATURAL GAS LIQUIDS PHOTODIODES PLASMA RADIATION SOURCES RADIATIONS SEMICONDUCTOR DEVICES SEMICONDUCTOR DIODES TRANSITION ELEMENTS ULTRAVIOLET RADIATION WAVE FORMS X RADIATION X-RAY LASERS |
| title | X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma |
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