X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma

A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (...

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Hauptverfasser:	Chan, L. S., Ghomeishi, M., Yap, S. L., Wong, C. S.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	ABLATION ANODES COPPER CURRENTS ELECTRIC POTENTIAL ELECTRODES ELECTROMAGNETIC RADIATION ELEMENTS EMISSION EXTREME ULTRAVIOLET RADIATION FILTERS FLUIDS INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY IONIZING RADIATIONS LASERS LIQUIDS METALS NATURAL GAS LIQUIDS PHOTODIODES PLASMA RADIATION SOURCES RADIATIONS SEMICONDUCTOR DEVICES SEMICONDUCTOR DIODES TRANSITION ELEMENTS ULTRAVIOLET RADIATION WAVE FORMS X RADIATION X-RAY LASERS
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Beschreibung
Zusammenfassung:	A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (measured by PIN diode) and extreme ultraviolet, EUV (measured by SXUV5A with integrated filter) can be measured simultaneously when good pinching discharge as indicated by sharp dip in the waveform of the rate of current is achieved. For discharge with mild pinching, only EUV emission is observed.
ISSN:	0094-243X 1551-7616
DOI:	10.1063/1.3469706