Co/Mg/X Multilayer Mirrors For the EUV Range

A new material combination namely Co/Mg multilayer designed for optics applications in the EUV range, is reported. Simulations show that reflectivity value of the Co/Mg multilayer can reach a reflectivity of 55% at 25.2 nm (49.2 eV), when the grazing incidence angle is set to 45° and s polarization...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Hu, M.‐H., Le Guen, K., André, J.‐M., Jonnard, P., Zhou, S. K., Li, H. Ch, Zhu, J. T., Wang, Z. S.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A new material combination namely Co/Mg multilayer designed for optics applications in the EUV range, is reported. Simulations show that reflectivity value of the Co/Mg multilayer can reach a reflectivity of 55% at 25.2 nm (49.2 eV), when the grazing incidence angle is set to 45° and s polarization is considered. The introduction of additional materials, e.g., Y and Zr can improve the reflectivity to 61%. Co/Mg and Co / Mg / B 4 C multilayers have been deposited following the parameters deduced from the simulations. The introduction of a B 4 C barrier layer would in principle increase the multilayer reflectivity to 61%. In fact the reflectivity measurements at 0.154 nm show that the introduction of B 4 C does not improve the structural quality of the multilayers.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.3399257