Growth and Characterization of Cobalt Doped Titanium Dioxide Thin Films by Pulsed Laser Deposition
Highly oriented rutile and anatase TiO(2):Co films have been grown on sapphire and SrTiO(3) substrates by pulsed laser deposition with Co concentrations of 3 % and 12 %. All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB...
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description | Highly oriented rutile and anatase TiO(2):Co films have been grown on sapphire and SrTiO(3) substrates by pulsed laser deposition with Co concentrations of 3 % and 12 %. All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB to 1.2 muB. The resistivity shows activated behavior where the activation energy ranges from 67 meV to 79 meV. Our results are consistent with other reports on dilute ferromagnetic TiO(2):Co films prepared under similar growth conditions. |
doi_str_mv | 10.1063/1.3203220 |
format | Conference Proceeding |
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All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB to 1.2 muB. The resistivity shows activated behavior where the activation energy ranges from 67 meV to 79 meV. Our results are consistent with other reports on dilute ferromagnetic TiO(2):Co films prepared under similar growth conditions.</description><identifier>ISSN: 0094-243X</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/1.3203220</identifier><language>eng</language><publisher>United States</publisher><subject>ACTIVATION ENERGY ; ALKALINE EARTH METAL COMPOUNDS ; CHALCOGENIDES ; COBALT ; COHERENT SCATTERING ; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ; CORUNDUM ; CRYSTAL GROWTH ; DEPOSITION ; DIFFRACTION ; DOPED MATERIALS ; ELECTRIC CONDUCTIVITY ; ELECTRICAL PROPERTIES ; ELECTROMAGNETIC RADIATION ; ELEMENTS ; ENERGY ; ENERGY BEAM DEPOSITION ; ENERGY RANGE ; EV RANGE ; FERROMAGNETIC MATERIALS ; FERROMAGNETISM ; IRRADIATION ; LASER RADIATION ; MAGNETIC MATERIALS ; MAGNETISM ; MATERIALS ; MATERIALS SCIENCE ; METALS ; MINERALS ; OXIDE MINERALS ; OXIDES ; OXYGEN COMPOUNDS ; PHYSICAL PROPERTIES ; PULSED IRRADIATION ; RADIATIONS ; SAPPHIRE ; SCATTERING ; SEMICONDUCTOR MATERIALS ; STRONTIUM COMPOUNDS ; STRONTIUM TITANATES ; SUBSTRATES ; SURFACE COATING ; THIN FILMS ; TITANATES ; TITANIUM COMPOUNDS ; TITANIUM OXIDES ; TRANSITION ELEMENT COMPOUNDS ; TRANSITION ELEMENTS ; X-RAY DIFFRACTION</subject><ispartof>AIP conference proceedings, 2009, Vol.1151 (1), p.137-140</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/21344289$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Hyndman, A R</creatorcontrib><creatorcontrib>Williams, G V M</creatorcontrib><creatorcontrib>Reeves, R J</creatorcontrib><creatorcontrib>McCann, D M</creatorcontrib><title>Growth and Characterization of Cobalt Doped Titanium Dioxide Thin Films by Pulsed Laser Deposition</title><title>AIP conference proceedings</title><description>Highly oriented rutile and anatase TiO(2):Co films have been grown on sapphire and SrTiO(3) substrates by pulsed laser deposition with Co concentrations of 3 % and 12 %. All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB to 1.2 muB. The resistivity shows activated behavior where the activation energy ranges from 67 meV to 79 meV. Our results are consistent with other reports on dilute ferromagnetic TiO(2):Co films prepared under similar growth conditions.</description><subject>ACTIVATION ENERGY</subject><subject>ALKALINE EARTH METAL COMPOUNDS</subject><subject>CHALCOGENIDES</subject><subject>COBALT</subject><subject>COHERENT SCATTERING</subject><subject>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</subject><subject>CORUNDUM</subject><subject>CRYSTAL GROWTH</subject><subject>DEPOSITION</subject><subject>DIFFRACTION</subject><subject>DOPED MATERIALS</subject><subject>ELECTRIC CONDUCTIVITY</subject><subject>ELECTRICAL PROPERTIES</subject><subject>ELECTROMAGNETIC RADIATION</subject><subject>ELEMENTS</subject><subject>ENERGY</subject><subject>ENERGY BEAM DEPOSITION</subject><subject>ENERGY RANGE</subject><subject>EV RANGE</subject><subject>FERROMAGNETIC MATERIALS</subject><subject>FERROMAGNETISM</subject><subject>IRRADIATION</subject><subject>LASER RADIATION</subject><subject>MAGNETIC MATERIALS</subject><subject>MAGNETISM</subject><subject>MATERIALS</subject><subject>MATERIALS SCIENCE</subject><subject>METALS</subject><subject>MINERALS</subject><subject>OXIDE MINERALS</subject><subject>OXIDES</subject><subject>OXYGEN COMPOUNDS</subject><subject>PHYSICAL PROPERTIES</subject><subject>PULSED IRRADIATION</subject><subject>RADIATIONS</subject><subject>SAPPHIRE</subject><subject>SCATTERING</subject><subject>SEMICONDUCTOR MATERIALS</subject><subject>STRONTIUM COMPOUNDS</subject><subject>STRONTIUM TITANATES</subject><subject>SUBSTRATES</subject><subject>SURFACE COATING</subject><subject>THIN FILMS</subject><subject>TITANATES</subject><subject>TITANIUM COMPOUNDS</subject><subject>TITANIUM OXIDES</subject><subject>TRANSITION ELEMENT COMPOUNDS</subject><subject>TRANSITION ELEMENTS</subject><subject>X-RAY DIFFRACTION</subject><issn>0094-243X</issn><issn>1551-7616</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2009</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotj8tKxDAYRoMoOI4ufIOA4K5jbk2TpXScUSjoYgR3Jf2b0kgnGZsUL09vZVx9i3M48CF0TcmKEsnv6IozwhkjJ2hB85xmhaTyFC0I0SJjgr-do4sY3wlhuijUAjXbMXymHhvf4rI3o4FkR_djkgsehw6XoTFDwutwsC3euWS8m_Z47cKXay3e9c7jjRv2ETff-GUa4mxVJtoRr-0hRPeXuURnnZnJ1f8u0evmYVc-ZtXz9qm8r7LAqEiZJUUnlJGSqPmJYSoH1hLBJciuaKGROi8Ygxxk0xqqjKKMdWA50XkDRgNfoptjN8Tk6gguWegheG8h1YxyIZjSs3V7tA5j-JhsTPXeRbDDYLwNU6y50EoSofkvHyZjPA</recordid><startdate>20090101</startdate><enddate>20090101</enddate><creator>Hyndman, A R</creator><creator>Williams, G V M</creator><creator>Reeves, R J</creator><creator>McCann, D M</creator><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>20090101</creationdate><title>Growth and Characterization of Cobalt Doped Titanium Dioxide Thin Films by Pulsed Laser Deposition</title><author>Hyndman, A R ; 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All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB to 1.2 muB. The resistivity shows activated behavior where the activation energy ranges from 67 meV to 79 meV. Our results are consistent with other reports on dilute ferromagnetic TiO(2):Co films prepared under similar growth conditions.</abstract><cop>United States</cop><doi>10.1063/1.3203220</doi><tpages>4</tpages></addata></record> |
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subjects | ACTIVATION ENERGY ALKALINE EARTH METAL COMPOUNDS CHALCOGENIDES COBALT COHERENT SCATTERING CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY CORUNDUM CRYSTAL GROWTH DEPOSITION DIFFRACTION DOPED MATERIALS ELECTRIC CONDUCTIVITY ELECTRICAL PROPERTIES ELECTROMAGNETIC RADIATION ELEMENTS ENERGY ENERGY BEAM DEPOSITION ENERGY RANGE EV RANGE FERROMAGNETIC MATERIALS FERROMAGNETISM IRRADIATION LASER RADIATION MAGNETIC MATERIALS MAGNETISM MATERIALS MATERIALS SCIENCE METALS MINERALS OXIDE MINERALS OXIDES OXYGEN COMPOUNDS PHYSICAL PROPERTIES PULSED IRRADIATION RADIATIONS SAPPHIRE SCATTERING SEMICONDUCTOR MATERIALS STRONTIUM COMPOUNDS STRONTIUM TITANATES SUBSTRATES SURFACE COATING THIN FILMS TITANATES TITANIUM COMPOUNDS TITANIUM OXIDES TRANSITION ELEMENT COMPOUNDS TRANSITION ELEMENTS X-RAY DIFFRACTION |
title | Growth and Characterization of Cobalt Doped Titanium Dioxide Thin Films by Pulsed Laser Deposition |
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