Growth and Characterization of Cobalt Doped Titanium Dioxide Thin Films by Pulsed Laser Deposition

Highly oriented rutile and anatase TiO(2):Co films have been grown on sapphire and SrTiO(3) substrates by pulsed laser deposition with Co concentrations of 3 % and 12 %. All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB...

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Bibliographische Detailangaben
Hauptverfasser:	Hyndman, A R, Williams, G V M, Reeves, R J, McCann, D M
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	ACTIVATION ENERGY ALKALINE EARTH METAL COMPOUNDS CHALCOGENIDES COBALT COHERENT SCATTERING CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY CORUNDUM CRYSTAL GROWTH DEPOSITION DIFFRACTION DOPED MATERIALS ELECTRIC CONDUCTIVITY ELECTRICAL PROPERTIES ELECTROMAGNETIC RADIATION ELEMENTS ENERGY ENERGY BEAM DEPOSITION ENERGY RANGE EV RANGE FERROMAGNETIC MATERIALS FERROMAGNETISM IRRADIATION LASER RADIATION MAGNETIC MATERIALS MAGNETISM MATERIALS MATERIALS SCIENCE METALS MINERALS OXIDE MINERALS OXIDES OXYGEN COMPOUNDS PHYSICAL PROPERTIES PULSED IRRADIATION RADIATIONS SAPPHIRE SCATTERING SEMICONDUCTOR MATERIALS STRONTIUM COMPOUNDS STRONTIUM TITANATES SUBSTRATES SURFACE COATING THIN FILMS TITANATES TITANIUM COMPOUNDS TITANIUM OXIDES TRANSITION ELEMENT COMPOUNDS TRANSITION ELEMENTS X-RAY DIFFRACTION
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Beschreibung
Zusammenfassung:	Highly oriented rutile and anatase TiO(2):Co films have been grown on sapphire and SrTiO(3) substrates by pulsed laser deposition with Co concentrations of 3 % and 12 %. All films are transparent with optical gaps > 3 eV and show ferromagnetic behavior where the moment per Co ranges from 0.27 muB to 1.2 muB. The resistivity shows activated behavior where the activation energy ranges from 67 meV to 79 meV. Our results are consistent with other reports on dilute ferromagnetic TiO(2):Co films prepared under similar growth conditions.
ISSN:	0094-243X 1551-7616
DOI:	10.1063/1.3203220