Introduction of the MC3-II/WR System, an Extended Energy Medium Current Ion Implanter
The MC3-II/WR is a medium-current ion implanter, newly developed by SEN Corporation. The most significant change from the original MC3-II is an expansion of its energy coverage with an extended terminal voltage from 260 kV to 320 kV. This expansion takes in a large portion of high energy application...
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Format: | Tagungsbericht |
Sprache: | eng |
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Zusammenfassung: | The MC3-II/WR is a medium-current ion implanter, newly developed by SEN Corporation. The most significant change from the original MC3-II is an expansion of its energy coverage with an extended terminal voltage from 260 kV to 320 kV. This expansion takes in a large portion of high energy applications and results in significant cost reduction of device production. The MC3-II system was developed to meet requirements of advanced LSI's, especially requirements for implant accuracy through its controllability of beam quality, keeping productivity high or. The MC3-II/WR inherits the MC3-II's advantages and enhances its capability in the energy region and mechanical throughput. |
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ISSN: | 0094-243X 1551-7616 |
DOI: | 10.1063/1.3033610 |