Introduction of the MC3-II/WR System, an Extended Energy Medium Current Ion Implanter

The MC3-II/WR is a medium-current ion implanter, newly developed by SEN Corporation. The most significant change from the original MC3-II is an expansion of its energy coverage with an extended terminal voltage from 260 kV to 320 kV. This expansion takes in a large portion of high energy application...

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Bibliographische Detailangaben
Hauptverfasser: Sugitani, Michiro, Sato, Fumiaki, Koike, Masazumi, Sano, Makoto, Ueno, Kazuyoshi
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:The MC3-II/WR is a medium-current ion implanter, newly developed by SEN Corporation. The most significant change from the original MC3-II is an expansion of its energy coverage with an extended terminal voltage from 260 kV to 320 kV. This expansion takes in a large portion of high energy applications and results in significant cost reduction of device production. The MC3-II system was developed to meet requirements of advanced LSI's, especially requirements for implant accuracy through its controllability of beam quality, keeping productivity high or. The MC3-II/WR inherits the MC3-II's advantages and enhances its capability in the energy region and mechanical throughput.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.3033610