Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam
As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in I...
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Veröffentlicht in: | AIP conference proceedings 1999-06, Vol.475 (1) |
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creator | Guo, B. N. El Bouanani, M. Duggan, J. L. McDaniel, F. D. Renfrow, S. N. Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185 Doyle, B. L. Walsh, D. S. Aton, T. J. |
description | As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in ICs. The IBICC measurements, conducted at the Sandia National Laboratories, employed a 10 MeV carbon microbeam with 1{mu}m diameter spot to scan test structures on specifically designed ICs. With the aid of IC layout information, an analysis of the charge collection efficiency from different test areas is presented. |
doi_str_mv | 10.1063/1.59108 |
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fullrecord | <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_21205542</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>21205542</sourcerecordid><originalsourceid>FETCH-LOGICAL-o146t-11a5c9005169a26e56a7458db594e57893d5ada4f959b826c6f9f41e26e0f3b43</originalsourceid><addsrcrecordid>eNotj01LxDAURYMoOI7iXwi40UXHvDRJm6UWPwojblTcDenr60xkpoEk_f920NVd3MO5XMauQaxAmPIeVtqCqE_YArSGojJgTtlCCKsKqcrvc3aR0o8Q0lZVvWCxDSPvyB24H_sJqee4c3FLHMN-T5j9XN-2j23T3PEhhiOWaRtdPpI-4uQzz5QyTzlOmKdIiU_Jj1vuOAj-Rl8cXexmy8FjDMelS3Y2uH2iq_9css_np4_mtVi_v7TNw7oIoEwuAJxGK4QGY500pI2rlK77TltFuqpt2WvXOzVYbbtaGjSDHRTQjIqh7FS5ZDd_3pCy3yT0mXCHYRznWxsJUmitZPkLaCpaFQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam</title><source>AIP Journals Complete</source><creator>Guo, B. N. ; El Bouanani, M. ; Duggan, J. L. ; McDaniel, F. D. ; Renfrow, S. N. ; Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185 ; Doyle, B. L. ; Walsh, D. S. ; Aton, T. J.</creator><creatorcontrib>Guo, B. N. ; El Bouanani, M. ; Duggan, J. L. ; McDaniel, F. D. ; Renfrow, S. N. ; Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185 ; Doyle, B. L. ; Walsh, D. S. ; Aton, T. J.</creatorcontrib><description>As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in ICs. The IBICC measurements, conducted at the Sandia National Laboratories, employed a 10 MeV carbon microbeam with 1{mu}m diameter spot to scan test structures on specifically designed ICs. With the aid of IC layout information, an analysis of the charge collection efficiency from different test areas is presented.</description><identifier>ISSN: 0094-243X</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/1.59108</identifier><language>eng</language><publisher>United States</publisher><subject>CARBON IONS ; CHARGE COLLECTION ; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ; FIELD EFFECT TRANSISTORS ; INTEGRATED CIRCUITS ; ION BEAMS ; IRRADIATION ; MEV RANGE ; NEUTRON FLUENCE ; PHYSICAL RADIATION EFFECTS ; RECOILS ; SANDIA NATIONAL LABORATORIES ; SENSITIVITY ; SILICON</subject><ispartof>AIP conference proceedings, 1999-06, Vol.475 (1)</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,777,781,882,27905,27906</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/21205542$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Guo, B. N.</creatorcontrib><creatorcontrib>El Bouanani, M.</creatorcontrib><creatorcontrib>Duggan, J. L.</creatorcontrib><creatorcontrib>McDaniel, F. D.</creatorcontrib><creatorcontrib>Renfrow, S. N.</creatorcontrib><creatorcontrib>Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185</creatorcontrib><creatorcontrib>Doyle, B. L.</creatorcontrib><creatorcontrib>Walsh, D. S.</creatorcontrib><creatorcontrib>Aton, T. J.</creatorcontrib><title>Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam</title><title>AIP conference proceedings</title><description>As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in ICs. The IBICC measurements, conducted at the Sandia National Laboratories, employed a 10 MeV carbon microbeam with 1{mu}m diameter spot to scan test structures on specifically designed ICs. With the aid of IC layout information, an analysis of the charge collection efficiency from different test areas is presented.</description><subject>CARBON IONS</subject><subject>CHARGE COLLECTION</subject><subject>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</subject><subject>FIELD EFFECT TRANSISTORS</subject><subject>INTEGRATED CIRCUITS</subject><subject>ION BEAMS</subject><subject>IRRADIATION</subject><subject>MEV RANGE</subject><subject>NEUTRON FLUENCE</subject><subject>PHYSICAL RADIATION EFFECTS</subject><subject>RECOILS</subject><subject>SANDIA NATIONAL LABORATORIES</subject><subject>SENSITIVITY</subject><subject>SILICON</subject><issn>0094-243X</issn><issn>1551-7616</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNotj01LxDAURYMoOI7iXwi40UXHvDRJm6UWPwojblTcDenr60xkpoEk_f920NVd3MO5XMauQaxAmPIeVtqCqE_YArSGojJgTtlCCKsKqcrvc3aR0o8Q0lZVvWCxDSPvyB24H_sJqee4c3FLHMN-T5j9XN-2j23T3PEhhiOWaRtdPpI-4uQzz5QyTzlOmKdIiU_Jj1vuOAj-Rl8cXexmy8FjDMelS3Y2uH2iq_9css_np4_mtVi_v7TNw7oIoEwuAJxGK4QGY500pI2rlK77TltFuqpt2WvXOzVYbbtaGjSDHRTQjIqh7FS5ZDd_3pCy3yT0mXCHYRznWxsJUmitZPkLaCpaFQ</recordid><startdate>19990610</startdate><enddate>19990610</enddate><creator>Guo, B. N.</creator><creator>El Bouanani, M.</creator><creator>Duggan, J. L.</creator><creator>McDaniel, F. D.</creator><creator>Renfrow, S. N.</creator><creator>Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185</creator><creator>Doyle, B. L.</creator><creator>Walsh, D. S.</creator><creator>Aton, T. J.</creator><scope>OTOTI</scope></search><sort><creationdate>19990610</creationdate><title>Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam</title><author>Guo, B. N. ; El Bouanani, M. ; Duggan, J. L. ; McDaniel, F. D. ; Renfrow, S. N. ; Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185 ; Doyle, B. L. ; Walsh, D. S. ; Aton, T. J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o146t-11a5c9005169a26e56a7458db594e57893d5ada4f959b826c6f9f41e26e0f3b43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><topic>CARBON IONS</topic><topic>CHARGE COLLECTION</topic><topic>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</topic><topic>FIELD EFFECT TRANSISTORS</topic><topic>INTEGRATED CIRCUITS</topic><topic>ION BEAMS</topic><topic>IRRADIATION</topic><topic>MEV RANGE</topic><topic>NEUTRON FLUENCE</topic><topic>PHYSICAL RADIATION EFFECTS</topic><topic>RECOILS</topic><topic>SANDIA NATIONAL LABORATORIES</topic><topic>SENSITIVITY</topic><topic>SILICON</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Guo, B. N.</creatorcontrib><creatorcontrib>El Bouanani, M.</creatorcontrib><creatorcontrib>Duggan, J. L.</creatorcontrib><creatorcontrib>McDaniel, F. D.</creatorcontrib><creatorcontrib>Renfrow, S. N.</creatorcontrib><creatorcontrib>Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185</creatorcontrib><creatorcontrib>Doyle, B. L.</creatorcontrib><creatorcontrib>Walsh, D. S.</creatorcontrib><creatorcontrib>Aton, T. J.</creatorcontrib><collection>OSTI.GOV</collection><jtitle>AIP conference proceedings</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Guo, B. N.</au><au>El Bouanani, M.</au><au>Duggan, J. L.</au><au>McDaniel, F. D.</au><au>Renfrow, S. N.</au><au>Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185</au><au>Doyle, B. L.</au><au>Walsh, D. S.</au><au>Aton, T. J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam</atitle><jtitle>AIP conference proceedings</jtitle><date>1999-06-10</date><risdate>1999</risdate><volume>475</volume><issue>1</issue><issn>0094-243X</issn><eissn>1551-7616</eissn><abstract>As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in ICs. The IBICC measurements, conducted at the Sandia National Laboratories, employed a 10 MeV carbon microbeam with 1{mu}m diameter spot to scan test structures on specifically designed ICs. With the aid of IC layout information, an analysis of the charge collection efficiency from different test areas is presented.</abstract><cop>United States</cop><doi>10.1063/1.59108</doi><oa>free_for_read</oa></addata></record> |
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subjects | CARBON IONS CHARGE COLLECTION CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY FIELD EFFECT TRANSISTORS INTEGRATED CIRCUITS ION BEAMS IRRADIATION MEV RANGE NEUTRON FLUENCE PHYSICAL RADIATION EFFECTS RECOILS SANDIA NATIONAL LABORATORIES SENSITIVITY SILICON |
title | Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T10%3A02%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-osti&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Ion%20beam%20induced%20charge%20collection%20(IBICC)%20from%20integrated%20circuit%20test%20structures%20using%20a%2010%20MeV%20carbon%20microbeam&rft.jtitle=AIP%20conference%20proceedings&rft.au=Guo,%20B.%20N.&rft.date=1999-06-10&rft.volume=475&rft.issue=1&rft.issn=0094-243X&rft.eissn=1551-7616&rft_id=info:doi/10.1063/1.59108&rft_dat=%3Costi%3E21205542%3C/osti%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |