Ion beam induced charge collection (IBICC) from integrated circuit test structures using a 10 MeV carbon microbeam

As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in I...

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Veröffentlicht in:AIP conference proceedings 1999-06, Vol.475 (1)
Hauptverfasser: Guo, B. N., El Bouanani, M., Duggan, J. L., McDaniel, F. D., Renfrow, S. N., Ion Beam Materials Research Laboratory, Sandia National Laboratories, MS 1056, PO Box 5800, Albuquerque, New Mexico 87185, Doyle, B. L., Walsh, D. S., Aton, T. J.
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Sprache:eng
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Zusammenfassung:As feature sizes of Integrated Circuits (ICs) continue to shrink, the sensitivity of these devices, particularly SRAMs and DRAMs, to natural radiation is increasing. In this paper, the Ion Beam Induced Charge Collection (IBICC) technique is utilized to simulate neutron-induced Si recoil effects in ICs. The IBICC measurements, conducted at the Sandia National Laboratories, employed a 10 MeV carbon microbeam with 1{mu}m diameter spot to scan test structures on specifically designed ICs. With the aid of IC layout information, an analysis of the charge collection efficiency from different test areas is presented.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.59108