Optical band gap of BiFeO{sub 3} grown by molecular-beam epitaxy

BiFeO{sub 3} thin films have been deposited on (001) SrTiO{sub 3} substrates by adsorption-controlled reactive molecular-beam epitaxy. For a given bismuth overpressure and oxygen activity, single-phase BiFeO{sub 3} films can be grown over a range of deposition temperatures in accordance with thermod...

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Veröffentlicht in:Applied physics letters 2008-04, Vol.92 (14)
Hauptverfasser: Ihlefeld, J. F., Department of Materials Science and Engineering, University of California, Berkeley, California 94720, Podraza, N. J., Liu, Z. K., Schlom, D. G., Rai, R. C., Xu, X., Musfeldt, J. L., Heeg, T., Schubert, J., Chen, Y. B., Pan, X. Q., Li, J., Collins, R. W., Ramesh, R., Department of Physics, University of California, Berkeley, California 94720
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Sprache:eng
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Zusammenfassung:BiFeO{sub 3} thin films have been deposited on (001) SrTiO{sub 3} substrates by adsorption-controlled reactive molecular-beam epitaxy. For a given bismuth overpressure and oxygen activity, single-phase BiFeO{sub 3} films can be grown over a range of deposition temperatures in accordance with thermodynamic calculations. Four-circle x-ray diffraction reveals phase-pure, epitaxial films with {omega} rocking curve full width at half maximum values as narrow as 29 arc sec (0.008 deg.). Multiple-angle spectroscopic ellipsometry reveals a direct optical band gap at 2.74 eV for stoichiometric as well as 5% bismuth-deficient single-phase BiFeO{sub 3} films.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2901160