Gas-discharge plasma sources for nonlocal plasma technology

Nonlocal plasma technology is based on the effect of self-trapping of fast electrons in the plasma volume [ V. I. Demidov , C. A. DeJoseph, Jr. , and A. A. Kudryavtsev , Phys. Rev. Lett. 95 , 215002 ( 2006 ) ]. This effect can be achieved by changing the ratio of fast electron flux to ion flux incid...

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Veröffentlicht in:Applied physics letters 2007-11, Vol.91 (20), p.201503-201503-3
Hauptverfasser: Demidov, V. I., DeJoseph, C. A., Simonov, V. Ya
Format: Artikel
Sprache:eng
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Zusammenfassung:Nonlocal plasma technology is based on the effect of self-trapping of fast electrons in the plasma volume [ V. I. Demidov , C. A. DeJoseph, Jr. , and A. A. Kudryavtsev , Phys. Rev. Lett. 95 , 215002 ( 2006 ) ]. This effect can be achieved by changing the ratio of fast electron flux to ion flux incident on the plasma boundaries. This in turn leads to a significant change in plasma properties and therefore can be useful for technological applications. A gas-discharge device which demonstrates control of the plasma properties by this method is described.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2815930