Gas-discharge plasma sources for nonlocal plasma technology
Nonlocal plasma technology is based on the effect of self-trapping of fast electrons in the plasma volume [ V. I. Demidov , C. A. DeJoseph, Jr. , and A. A. Kudryavtsev , Phys. Rev. Lett. 95 , 215002 ( 2006 ) ]. This effect can be achieved by changing the ratio of fast electron flux to ion flux incid...
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Veröffentlicht in: | Applied physics letters 2007-11, Vol.91 (20), p.201503-201503-3 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Nonlocal plasma technology is based on the effect of self-trapping of fast electrons in the plasma volume [
V. I. Demidov
,
C. A. DeJoseph, Jr.
, and
A. A. Kudryavtsev
,
Phys. Rev. Lett.
95
,
215002
(
2006
)
]. This effect can be achieved by changing the ratio of fast electron flux to ion flux incident on the plasma boundaries. This in turn leads to a significant change in plasma properties and therefore can be useful for technological applications. A gas-discharge device which demonstrates control of the plasma properties by this method is described. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2815930 |