Molecular beam epitaxy of phase pure cubic InN
Cubic InN layers were grown by plasma assisted molecular beam epitaxy on 3 C - Si C (001) substrates at growth temperatures from 419 to 490 ° C . X-ray diffraction investigations show that the layers have zinc blende structure with only a small fraction of wurtzite phase inclusions on the (111) face...
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Veröffentlicht in: | Applied physics letters 2006-12, Vol.89 (26), p.261903-261903-3 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Cubic InN layers were grown by plasma assisted molecular beam epitaxy on
3
C
-
Si
C
(001) substrates at growth temperatures from
419
to
490
°
C
. X-ray diffraction investigations show that the layers have zinc blende structure with only a small fraction of wurtzite phase inclusions on the (111) facets of the cubic layer. The full width at half maximum of the
c
-
In
N
(002) x-ray rocking curve is less than
50
arc
min
. The lattice constant is
5.01
±
0.01
Å
. Low temperature photoluminescence measurements yield a
c
-
In
N
band gap of
0.61
eV
. At room temperature the band gap is about
0.56
eV
and the free electron concentration is about
n
∼
1.7
×
10
19
cm
−
3
. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2422913 |