Molecular beam epitaxy of phase pure cubic InN

Cubic InN layers were grown by plasma assisted molecular beam epitaxy on 3 C - Si C (001) substrates at growth temperatures from 419 to 490 ° C . X-ray diffraction investigations show that the layers have zinc blende structure with only a small fraction of wurtzite phase inclusions on the (111) face...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2006-12, Vol.89 (26), p.261903-261903-3
Hauptverfasser: Schörmann, J., As, D. J., Lischka, K., Schley, P., Goldhahn, R., Li, S. F., Löffler, W., Hetterich, M., Kalt, H.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Cubic InN layers were grown by plasma assisted molecular beam epitaxy on 3 C - Si C (001) substrates at growth temperatures from 419 to 490 ° C . X-ray diffraction investigations show that the layers have zinc blende structure with only a small fraction of wurtzite phase inclusions on the (111) facets of the cubic layer. The full width at half maximum of the c - In N (002) x-ray rocking curve is less than 50 arc min . The lattice constant is 5.01 ± 0.01 Å . Low temperature photoluminescence measurements yield a c - In N band gap of 0.61 eV . At room temperature the band gap is about 0.56 eV and the free electron concentration is about n ∼ 1.7 × 10 19 cm − 3 .
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2422913