White electroluminescence from C- and Si-rich thin silicon oxides

White electroluminescence from carbon- and silicon-rich silicon oxide layers is reported. The films were fabricated by Si and C ion implantation at low energy in 40 nm thick Si O 2 , followed by annealing at 1100 ° C . Structural and optical studies allow assigning the electroluminescence to Si nano...

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Veröffentlicht in:Applied physics letters 2006-12, Vol.89 (25), p.253124-253124-3
Hauptverfasser: Jambois, O., Garrido, B., Pellegrino, P., Carreras, Josep, Pérez-Rodríguez, A., Montserrat, J., Bonafos, C., BenAssayag, G., Schamm, S.
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Sprache:eng
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Zusammenfassung:White electroluminescence from carbon- and silicon-rich silicon oxide layers is reported. The films were fabricated by Si and C ion implantation at low energy in 40 nm thick Si O 2 , followed by annealing at 1100 ° C . Structural and optical studies allow assigning the electroluminescence to Si nanocrystals for the red part of the spectrum, and to C-related centers for the blue and green components. The external efficiency has been estimated to 10 − 4 % . Electrical characteristics show a Fowler-Nordheim behavior for voltages above 25 V , corresponding to the onset of electroluminescence. This suggests that light emission is related to the impact ionization of radiative centers.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2423244