White electroluminescence from C- and Si-rich thin silicon oxides
White electroluminescence from carbon- and silicon-rich silicon oxide layers is reported. The films were fabricated by Si and C ion implantation at low energy in 40 nm thick Si O 2 , followed by annealing at 1100 ° C . Structural and optical studies allow assigning the electroluminescence to Si nano...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 2006-12, Vol.89 (25), p.253124-253124-3 |
---|---|
Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | White electroluminescence from carbon- and silicon-rich silicon oxide layers is reported. The films were fabricated by Si and C ion implantation at low energy in
40
nm
thick
Si
O
2
, followed by annealing at
1100
°
C
. Structural and optical studies allow assigning the electroluminescence to Si nanocrystals for the red part of the spectrum, and to C-related centers for the blue and green components. The external efficiency has been estimated to
10
−
4
%
. Electrical characteristics show a Fowler-Nordheim behavior for voltages above
25
V
, corresponding to the onset of electroluminescence. This suggests that light emission is related to the impact ionization of radiative centers. |
---|---|
ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2423244 |