Front-to-end simulations of the design of a laser wakefield accelerator with external injection
We report the design of a laser wakefield accelerator (LWA) with external injection by a rf photogun and acceleration by a linear wakefield in a capillary discharge channel. The design process is complex due to the large number of intricately coupled free parameters. To alleviate this problem, we pe...
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Veröffentlicht in: | Journal of applied physics 2006-06, Vol.99 (11) |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We report the design of a laser wakefield accelerator (LWA) with external injection by a rf photogun and acceleration by a linear wakefield in a capillary discharge channel. The design process is complex due to the large number of intricately coupled free parameters. To alleviate this problem, we performed front-to-end simulations of the complete system. The tool we used was the general particle-tracking code, extended with a module representing the linear wakefield by a two-dimensional traveling wave with appropriate wavelength and amplitude. Given the limitations of existing technology for the longest discharge plasma wavelength (∼50μm) and shortest electron bunch length (∼100μm), we studied the regime in which the wakefield acts as slicer and buncher, while rejecting a large fraction of the injected bunch. The optimized parameters for the injected bunch are 10pC, 300fs at 6.7MeV, to be injected into a 70mm long channel at a plasma density of 7×1023m−3. A linear wakefield is generated by a 2TW laser focused to 30μm. The simulations predict an accelerated output of 0.6pC, 10fs bunches at 90MeV, with energy spread below 10%. The design is currently being implemented. The design process also led to an important conclusion: output specifications directly comparable to those reported recently from “laser-into-gas jet” experiments are feasible, provided the performance of the rf photogun is considerably enhanced. The paper outlines a photogun design providing such a performance level. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.2195382 |