Nanoscale defect formation on InP (111) surfaces after MeV Sb implantation

We have studied the surface modifications as well as the surface roughness of the InP(111) surfaces after 1.5 MeV Sb ion implantations. A scanning probe microscope has been utilized to investigate the ion-implanted InP(111) surfaces. We observe the formation of nanoscale defect structures on the InP...

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Veröffentlicht in:Journal of applied physics 2006-01, Vol.99 (1), p.014304-014304-7
Hauptverfasser: Paramanik, Dipak, Pradhan, Asima, Varma, Shikha
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Sprache:eng
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Zusammenfassung:We have studied the surface modifications as well as the surface roughness of the InP(111) surfaces after 1.5 MeV Sb ion implantations. A scanning probe microscope has been utilized to investigate the ion-implanted InP(111) surfaces. We observe the formation of nanoscale defect structures on the InP surface. The density, height, and size of the nanostructures have been investigated here as a function of ion fluence. The rms surface roughness, of the ion implanted InP surfaces, has also been investigated. Raman-scattering results demonstrate that at the critical fluence, where the decrease in surface roughness occurs, the InP lattice becomes amorphous.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.2150262