Sn Plasma Focus Discharge for EUV Radiation Source
A small plasma focus device was constructed for the EUV radiation experiment. The storage energy of capacitor bank is 3.4 kj, and the maximum discharge current is 140 kA. Although the device was not well optimized for strong pinch, EUV radiation was observed from the focus plasma. The plasma dynamic...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 226 |
---|---|
container_issue | 1 |
container_start_page | 223 |
container_title | |
container_volume | 808 |
creator | Takasugi, Keiichi Umeda, Takeshi Kiuchi, Ena Hayashi, Takuya |
description | A small plasma focus device was constructed for the EUV radiation experiment. The storage energy of capacitor bank is 3.4 kj, and the maximum discharge current is 140 kA. Although the device was not well optimized for strong pinch, EUV radiation was observed from the focus plasma. The plasma dynamics was affected by electrode material, and the use of Sn electrode was proved to be effective for producing Sn plasma. |
doi_str_mv | 10.1063/1.2159358 |
format | Conference Proceeding |
fullrecord | <record><control><sourceid>proquest_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_20729255</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>29639661</sourcerecordid><originalsourceid>FETCH-LOGICAL-o214t-11282f098c8eba9ebe417137447412bd8eae6cbea8ffc286b4e8b2b4f619cc643</originalsourceid><addsrcrecordid>eNotj81KAzEYRYM_YK1d-AYBwd3UfPnPUmqrQkGxVtwNSfqNHZlOdDLz_q3U1YHL4cIh5BrYFJgWdzDloJxQ9oSMQCkojAZ9SibOWGaEkow7I87IiDEnCy7F5wW5zPmb_e3GjghftfS18Xnn6SLFIdOHOset776QVqmj8_UHffOb2vd1aukqDV3EK3Je-Sbj5J9jsl7M32dPxfLl8Xl2vywSB9kXANzyijkbLQbvMKAEA8JIaSTwsLHoUceA3lZV5FYHiTbwICsNLkYtxZjcHH9T7usyx7rHuI2pbTH2JWeGO67Uwbo9Wj9d-h0w9-XuUIBN41tMQy6508JpDWIPboBUYA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype><pqid>29639661</pqid></control><display><type>conference_proceeding</type><title>Sn Plasma Focus Discharge for EUV Radiation Source</title><source>AIP Journals Complete</source><creator>Takasugi, Keiichi ; Umeda, Takeshi ; Kiuchi, Ena ; Hayashi, Takuya</creator><creatorcontrib>Takasugi, Keiichi ; Umeda, Takeshi ; Kiuchi, Ena ; Hayashi, Takuya</creatorcontrib><description>A small plasma focus device was constructed for the EUV radiation experiment. The storage energy of capacitor bank is 3.4 kj, and the maximum discharge current is 140 kA. Although the device was not well optimized for strong pinch, EUV radiation was observed from the focus plasma. The plasma dynamics was affected by electrode material, and the use of Sn electrode was proved to be effective for producing Sn plasma.</description><identifier>ISSN: 0094-243X</identifier><identifier>ISBN: 9780735402973</identifier><identifier>ISBN: 0735402973</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/1.2159358</identifier><language>eng</language><publisher>United States</publisher><subject>70 PLASMA PHYSICS AND FUSION TECHNOLOGY ; CAPACITORS ; ELECTRIC CURRENTS ; ELECTRIC DISCHARGES ; ELECTRODES ; LIGHT SOURCES ; PLASMA ; PLASMA FOCUS ; PLASMA FOCUS DEVICES ; PLASMA PRODUCTION ; TIN</subject><ispartof>AIP conference proceedings, 2006, Vol.808 (1), p.223-226</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,27901,27902</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/20729255$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Takasugi, Keiichi</creatorcontrib><creatorcontrib>Umeda, Takeshi</creatorcontrib><creatorcontrib>Kiuchi, Ena</creatorcontrib><creatorcontrib>Hayashi, Takuya</creatorcontrib><title>Sn Plasma Focus Discharge for EUV Radiation Source</title><title>AIP conference proceedings</title><description>A small plasma focus device was constructed for the EUV radiation experiment. The storage energy of capacitor bank is 3.4 kj, and the maximum discharge current is 140 kA. Although the device was not well optimized for strong pinch, EUV radiation was observed from the focus plasma. The plasma dynamics was affected by electrode material, and the use of Sn electrode was proved to be effective for producing Sn plasma.</description><subject>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</subject><subject>CAPACITORS</subject><subject>ELECTRIC CURRENTS</subject><subject>ELECTRIC DISCHARGES</subject><subject>ELECTRODES</subject><subject>LIGHT SOURCES</subject><subject>PLASMA</subject><subject>PLASMA FOCUS</subject><subject>PLASMA FOCUS DEVICES</subject><subject>PLASMA PRODUCTION</subject><subject>TIN</subject><issn>0094-243X</issn><issn>1551-7616</issn><isbn>9780735402973</isbn><isbn>0735402973</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2006</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotj81KAzEYRYM_YK1d-AYBwd3UfPnPUmqrQkGxVtwNSfqNHZlOdDLz_q3U1YHL4cIh5BrYFJgWdzDloJxQ9oSMQCkojAZ9SibOWGaEkow7I87IiDEnCy7F5wW5zPmb_e3GjghftfS18Xnn6SLFIdOHOset776QVqmj8_UHffOb2vd1aukqDV3EK3Je-Sbj5J9jsl7M32dPxfLl8Xl2vywSB9kXANzyijkbLQbvMKAEA8JIaSTwsLHoUceA3lZV5FYHiTbwICsNLkYtxZjcHH9T7usyx7rHuI2pbTH2JWeGO67Uwbo9Wj9d-h0w9-XuUIBN41tMQy6508JpDWIPboBUYA</recordid><startdate>20060105</startdate><enddate>20060105</enddate><creator>Takasugi, Keiichi</creator><creator>Umeda, Takeshi</creator><creator>Kiuchi, Ena</creator><creator>Hayashi, Takuya</creator><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>20060105</creationdate><title>Sn Plasma Focus Discharge for EUV Radiation Source</title><author>Takasugi, Keiichi ; Umeda, Takeshi ; Kiuchi, Ena ; Hayashi, Takuya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o214t-11282f098c8eba9ebe417137447412bd8eae6cbea8ffc286b4e8b2b4f619cc643</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2006</creationdate><topic>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</topic><topic>CAPACITORS</topic><topic>ELECTRIC CURRENTS</topic><topic>ELECTRIC DISCHARGES</topic><topic>ELECTRODES</topic><topic>LIGHT SOURCES</topic><topic>PLASMA</topic><topic>PLASMA FOCUS</topic><topic>PLASMA FOCUS DEVICES</topic><topic>PLASMA PRODUCTION</topic><topic>TIN</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Takasugi, Keiichi</creatorcontrib><creatorcontrib>Umeda, Takeshi</creatorcontrib><creatorcontrib>Kiuchi, Ena</creatorcontrib><creatorcontrib>Hayashi, Takuya</creatorcontrib><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Takasugi, Keiichi</au><au>Umeda, Takeshi</au><au>Kiuchi, Ena</au><au>Hayashi, Takuya</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Sn Plasma Focus Discharge for EUV Radiation Source</atitle><btitle>AIP conference proceedings</btitle><date>2006-01-05</date><risdate>2006</risdate><volume>808</volume><issue>1</issue><spage>223</spage><epage>226</epage><pages>223-226</pages><issn>0094-243X</issn><eissn>1551-7616</eissn><isbn>9780735402973</isbn><isbn>0735402973</isbn><abstract>A small plasma focus device was constructed for the EUV radiation experiment. The storage energy of capacitor bank is 3.4 kj, and the maximum discharge current is 140 kA. Although the device was not well optimized for strong pinch, EUV radiation was observed from the focus plasma. The plasma dynamics was affected by electrode material, and the use of Sn electrode was proved to be effective for producing Sn plasma.</abstract><cop>United States</cop><doi>10.1063/1.2159358</doi><tpages>4</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0094-243X |
ispartof | AIP conference proceedings, 2006, Vol.808 (1), p.223-226 |
issn | 0094-243X 1551-7616 |
language | eng |
recordid | cdi_osti_scitechconnect_20729255 |
source | AIP Journals Complete |
subjects | 70 PLASMA PHYSICS AND FUSION TECHNOLOGY CAPACITORS ELECTRIC CURRENTS ELECTRIC DISCHARGES ELECTRODES LIGHT SOURCES PLASMA PLASMA FOCUS PLASMA FOCUS DEVICES PLASMA PRODUCTION TIN |
title | Sn Plasma Focus Discharge for EUV Radiation Source |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T18%3A01%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Sn%20Plasma%20Focus%20Discharge%20for%20EUV%20Radiation%20Source&rft.btitle=AIP%20conference%20proceedings&rft.au=Takasugi,%20Keiichi&rft.date=2006-01-05&rft.volume=808&rft.issue=1&rft.spage=223&rft.epage=226&rft.pages=223-226&rft.issn=0094-243X&rft.eissn=1551-7616&rft.isbn=9780735402973&rft.isbn_list=0735402973&rft_id=info:doi/10.1063/1.2159358&rft_dat=%3Cproquest_osti_%3E29639661%3C/proquest_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=29639661&rft_id=info:pmid/&rfr_iscdi=true |