Optimization of high B{sub sat} FeCo films for write pole applications

Optimization of high B{sub sat} FeCo films for write pole applications

FeCo films and their lamination with ultrathin NiFe layers down to 5 A were deposited using dc magnetron sputtering techniques. Soft magnetic FeCo films were obtained at an optimal target power of 500 W and an optimal deposition pressure of 2 mTorr with high saturation flux density, B{sub sat}>2....

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Veröffentlicht in:Journal of applied physics 2005-05, Vol.97 (10)
Hauptverfasser: Mao Ming, Schneider, Thomas, Bubber, Randhir, Kools, Jacques, Liu Xubo, Altounian, Zaven, Lee, C.-L., Devasahayam, Adrian, Rook, Katrina, Physics Department, McGill University, Montreal, Quebec, H3A 2T8, Veeco Instruments Plainview, Plainview, New York 11803
Format: Artikel
Sprache:eng
Schlagworte:
BINARY ALLOY SYSTEMS
COBALT ALLOYS
COERCIVE FORCE
DEPOSITION
FERROMAGNETIC MATERIALS
FLUX DENSITY
LAYERS
MAGNETIC FLUX
MAGNETOSTRICTION
MATERIALS SCIENCE
OPTIMIZATION
PERMALLOY
SPUTTERING
STRESSES
SUBSTRATES
THICKNESS
THIN FILMS
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Zusammenfassung:FeCo films and their lamination with ultrathin NiFe layers down to 5 A were deposited using dc magnetron sputtering techniques. Soft magnetic FeCo films were obtained at an optimal target power of 500 W and an optimal deposition pressure of 2 mTorr with high saturation flux density, B{sub sat}>2.4 T, and low easy-axis coercivity, H{sub ce}{
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1853951