Highly ordered self-organized dot patterns on Si surfaces by low-energy ion-beam erosion

Scanning force microscopy (AFM) and high-resolution transmission electron microscopy (HRTEM) have been used to investigate the complex topography evolution of Si surfaces during low-energy ion beam erosion. Depending on ion-beam parameters, a variety of different topographies can develop on the surf...

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Veröffentlicht in:Applied physics letters 2005-07, Vol.87 (3), p.033113-033113-3
Hauptverfasser: Ziberi, B., Frost, F., Rauschenbach, B., Höche, Th
Format: Artikel
Sprache:eng
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Zusammenfassung:Scanning force microscopy (AFM) and high-resolution transmission electron microscopy (HRTEM) have been used to investigate the complex topography evolution of Si surfaces during low-energy ion beam erosion. Depending on ion-beam parameters, a variety of different topographies can develop on the surface. At oblique ion-incidence angles, nanodots are formed for ion energies ⩾ 300 eV upon sample rotation. Properly chosen parameters of the broad-beam ion source result in dots possessing a very high degree of lateral ordering with a mean dot size λ ∼ 30 nm . Both, degree of ordering and size homogeneity of these nanostructures increases with erosion time leading to the most ordered self-organized patterns on Si surfaces reported thus far.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2000342