Evidence of interface-induced persistent photoconductivity in InP/In{sub 0.53}Ga{sub 0.47}As/InP double heterostructures grown by molecular-beam epitaxy

The impact of interface switching sequences on interface quality and minority carrier recombination in In{sub 0.53}Ga{sub 0.47}As/InP double heterostructure (DH) grown by solid-source molecular-beam epitaxy (MBE) was studied. As{sub 2} exposure at the lower In{sub 0.53}Ga{sub 0.47}As/InP interface p...

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Veröffentlicht in:Applied physics letters 2005-07, Vol.87 (3)
Hauptverfasser: Hudait, M.K., Lin, Y., Goss, S. H., Smith, P., Bradley, S., Brillson, L.J., Johnston, S.W., Ahrenkiel, R.K., Ringel, S.A., National Renewable Energy Laboratory, Golden, Colorado 80401, Department of Electrical and Computer Engineering, Ohio State University, Columbus, Ohio 43210
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Sprache:eng
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Zusammenfassung:The impact of interface switching sequences on interface quality and minority carrier recombination in In{sub 0.53}Ga{sub 0.47}As/InP double heterostructure (DH) grown by solid-source molecular-beam epitaxy (MBE) was studied. As{sub 2} exposure at the lower In{sub 0.53}Ga{sub 0.47}As/InP interface prior to In{sub 0.53}Ga{sub 0.47}As growth was found to cause enhanced As diffusion into the underlying InP that correlates with steadily increased photoconductive decay (PCD) lifetimes beyond the theoretical radiative and Auger limit. Low-temperature PCD measurements reveal that a persistent photoconductivity (PPC) process is responsible for the high 'apparent' lifetimes. The PPC effect increases monotonically with As{sub 2} exposure on the InP surface, implying the involvement of interfacial defects in the carrier recombination dynamics of In{sub 0.53}Ga{sub 0.47}As/InP DHs grown by MBE.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1994948