Radiative and nonradiative recombination processes in InN films grown by metal organic chemical vapor deposition

The 800meV photoluminescence band in indium nitride is excited under pulsed excitation conditions and is investigated as a function of temperature and time. Our results are consistent with a composite photoluminescence feature composed of two overlapping bands separated by an ∼10meV splitting, with...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2005-04, Vol.86 (14)
Hauptverfasser: Intartaglia, R., Maleyre, B., Ruffenach, S., Briot, O., Taliercio, T., Gil, B.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The 800meV photoluminescence band in indium nitride is excited under pulsed excitation conditions and is investigated as a function of temperature and time. Our results are consistent with a composite photoluminescence feature composed of two overlapping bands separated by an ∼10meV splitting, with populations described by a thermal equilibrium model. Efficient nonradiative recombination channels rule both the temperature dependence of the time-integrated photoluminescence spectra and the recombination dynamics. At 10K, the radiative recombination time is of the order of 300ns, while the nonradiative recombination time, which is ruled by activation energy of 8meV, is about 100ps.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1897428