High-reflectivity Pd∕Ni∕Al∕Ti∕Au ohmic contacts to p-type GaN for ultraviolet light-emitting diodes

Thermal stability, optical reflectivity, and contact resistivity of Pd∕Ni∕Al∕Ti∕Au ohmic contacts to p-type GaN were investigated. In contrast to its Pd∕Al∕Ti∕Au counterparts, Pd∕Ni∕Al∕Ti∕Au contacts retained their specific contact resistivity (76%) after long-term annealing at 150 °C in nitrogen am...

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Veröffentlicht in:Applied physics letters 2004-10, Vol.85 (14), p.2797-2799
Hauptverfasser: Chen, Guan-Ting, Pan, Chang-Chi, Fang, Chi-Shin, Huang, Tzu-Chien, Chyi, Jen-Inn, Chang, Mao-Nan, Huang, Sheng-Bang, Hsu, Jung-Tsung
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Sprache:eng
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Zusammenfassung:Thermal stability, optical reflectivity, and contact resistivity of Pd∕Ni∕Al∕Ti∕Au ohmic contacts to p-type GaN were investigated. In contrast to its Pd∕Al∕Ti∕Au counterparts, Pd∕Ni∕Al∕Ti∕Au contacts retained their specific contact resistivity (76%) after long-term annealing at 150 °C in nitrogen ambient. According to the results of the secondary ion mass spectroscopy study, it is suggested that the Ni layer prevents the penetration of Ti into GaN during thermal treatment.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1805199