Kinetics of phase formation in binary thin films: the Ni/Al case

The growth and/or dissociation of the intermetallic phases which are produced by interdiffusion in metallic thin film multilayers is studied by an approach based on a concentration-dependent diffusivity. No assumption is made on the a priori presence of seed layers of the phases that are expected to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Acta materialia 2000-03, Vol.48 (5), p.1201-1206
Hauptverfasser: Garcia, V.H., Mors, P.M., Scherer, C.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The growth and/or dissociation of the intermetallic phases which are produced by interdiffusion in metallic thin film multilayers is studied by an approach based on a concentration-dependent diffusivity. No assumption is made on the a priori presence of seed layers of the phases that are expected to grow. Application to the Ni/Al system gives a good agreement with the experimental data reported in the literature.
ISSN:1359-6454
1873-2453
DOI:10.1016/S1359-6454(99)00379-1