Microstructural analysis of tristructural isotropic particles in high-temperature steam mixed gas atmospheres

•Steam oxidation results of SiC at 1200 °C in 3–21% steam and 0–1% CO.•SiO2 growth were measured in low partial pressure of steam with CO present.•Crystalline SiO2 formed under all conditions.•SiC layer displays microstructural degradation in a high-temperature mixed gas atmosphere. High-temperature...

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Veröffentlicht in:Journal of nuclear materials 2023-06, Vol.579, p.154385, Article 154385
Hauptverfasser: Montoya, Katherine I., Brigham, Brian A., Helmreich, Grant, Werden, Jesse, Gerczak, Tyler J., Sooby, Elizabeth S.
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Sprache:eng
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Zusammenfassung:•Steam oxidation results of SiC at 1200 °C in 3–21% steam and 0–1% CO.•SiO2 growth were measured in low partial pressure of steam with CO present.•Crystalline SiO2 formed under all conditions.•SiC layer displays microstructural degradation in a high-temperature mixed gas atmosphere. High-temperature gas-cooled reactors (HTGRs) use tristructural isotropic (TRISO) particles embedded in a graphitic matrix material to form the integral fuel element. Potential off-normal reactor conditions for HTGRs include steam ingress with temperatures above 1,000 °C. Fuel element exposure to steam can cause the graphitic matrix material to evolve, forming an atmosphere composed of oxidants and oxidation products and potentially exposing the TRISO particles to these conditions. Investigating the oxidation response of TRISO particles exposed to a mixed gas atmosphere will provide insight into the stability under off-normal conditions. In this study, surrogate TRISO particles were exposed to high temperatures (T = 1,200 °C) in flowing steam (3% < pH2O < 21%) and CO (pCO < 1%) to determine the oxidation behavior of the SiC layer when exposed to various mixed gas atmospheres. Scanning electron microscopy, x-ray diffraction, and focused ion beam milling was used to determine the impact of CO and steam on the oxidation behavior of the SiC layer. The data presented demonstrates how the SiC layer showed strong oxidation resistance due to limited SiO2 growth and maintained its structural integrity under these off-normal conditions.
ISSN:0022-3115
1873-4820
DOI:10.1016/j.jnucmat.2023.154385