Automated Adsorption Workflow for Semiconductor Surfaces and the Application to Zinc Telluride

Surface adsorption is a crucial step in numerous processes, including heterogeneous catalysis, where the adsorption of key species is often used as a descriptor of efficiency. We present here an automated adsorption workflow for semiconductors which employs density functional theory calculations to...

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Veröffentlicht in:Journal of chemical information and modeling 2021-08, Vol.61 (8), p.3908-3916
Hauptverfasser: Andriuc, Oxana, Siron, Martin, Montoya, Joseph H, Horton, Matthew, Persson, Kristin A
Format: Artikel
Sprache:eng
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Zusammenfassung:Surface adsorption is a crucial step in numerous processes, including heterogeneous catalysis, where the adsorption of key species is often used as a descriptor of efficiency. We present here an automated adsorption workflow for semiconductors which employs density functional theory calculations to generate adsorption data in a high-throughput manner. Starting from a bulk structure, the workflow performs an exhaustive surface search, followed by an adsorption structure construction step, which generates a minimal energy landscape to determine the optimal adsorbate–surface distance. An extensive set of energy-based, charge-based, geometric, and electronic descriptors tailored toward catalysis research are computed and saved to a personal user database. The application of the workflow to zinc telluride, a promising CO2 reduction photocatalyst, is presented as a case study to illustrate the capabilities of this method and its potential as a material discovery tool.
ISSN:1549-9596
1549-960X
DOI:10.1021/acs.jcim.1c00340