Selective nitrogen adsorption via backbonding in a metal–organic framework with exposed vanadium sites
Industrial processes prominently feature π-acidic gases, and an adsorbent capable of selectively interacting with these molecules could enable important chemical separations 1 – 4 . Biological systems use accessible, reducing metal centres to bind and activate weakly π-acidic species, such as N 2 ,...
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Veröffentlicht in: | Nature materials 2020-05, Vol.19 (5), p.517-521 |
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Hauptverfasser: | , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Industrial processes prominently feature π-acidic gases, and an adsorbent capable of selectively interacting with these molecules could enable important chemical separations
1
–
4
. Biological systems use accessible, reducing metal centres to bind and activate weakly π-acidic species, such as N
2
, through backbonding interactions
5
–
7
, and incorporating analogous moieties into a porous material should give rise to a similar adsorption mechanism for these gaseous substrates
8
. Here, we report a metal–organic framework featuring exposed vanadium(
ii
) centres capable of back-donating electron density to weak π acids to successfully target π acidity for separation applications. This adsorption mechanism, together with a high concentration of available adsorption sites, results in record N
2
capacities and selectivities for the removal of N
2
from mixtures with CH
4
, while further enabling olefin/paraffin separations at elevated temperatures. Ultimately, incorporating such π-basic metal centres into porous materials offers a handle for capturing and activating key molecular species within next-generation adsorbents.
Nitrogenases use transition metals to selectively capture weak π acids such as N
2
by employing backbonding interactions. Here, a metal–organic framework with exposed vanadium sites is presented that uses this approach for selective capture of N
2
from CH
4
, with impressive selectivity and capacity. |
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ISSN: | 1476-1122 1476-4660 |
DOI: | 10.1038/s41563-019-0597-8 |