Electronic passivation of PbSe quantum dot solids by trimethylaluminum vapor dosing

[Display omitted] •Demonstrate the effect of trace defects on the electronic properties of PbSe solids.•Passivation of electronic defects using trimethyl aluminum (TMA).•10x improvement in on/off ratio and mobility of PbSe FET before and after TMA dosing. The inherent instability of PbSe quantum dot...

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Veröffentlicht in:Applied surface science 2020-05, Vol.513 (C), p.145812, Article 145812
Hauptverfasser: Ueda, Scott T., Kwak, Iljo, Abelson, Alex, Wolf, Steven, Qian, Caroline, Law, Matt, Kummel, Andrew C.
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Sprache:eng
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Zusammenfassung:[Display omitted] •Demonstrate the effect of trace defects on the electronic properties of PbSe solids.•Passivation of electronic defects using trimethyl aluminum (TMA).•10x improvement in on/off ratio and mobility of PbSe FET before and after TMA dosing. The inherent instability of PbSe quantum dot (QD) thin films in ambient atmospheric conditions presents a significant challenge to their use in devices. Using low-temperature scanning tunneling microscopy and scanning tunneling spectroscopy, the electronic passivation of epitaxially-fused PbSe QD superlattices (epi-SLs) by trimethylaluminum (TMA) vapor dosing was studied. TMA dosing immobilizes loosely bound mobile adsorbates and passivates states on the surface of the QDs. X-ray photoelectron spectra of QD films prepared by dip coating show an aluminum surface concentration of
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2020.145812