Atomic-Level Insight into the Postsynthesis Band Gap Engineering of a Lewis Base Polymer Using Lewis Acid Tris(pentafluorophenyl)borane

In this report, we investigate the binding properties of the Lewis acid tris­(penta­fluoro­phenyl)­borane with a Lewis base semiconducting polymer, PFPT, and the subsequent mechanism of band gap reduction. Experiments and quantum chemical calculations confirm that the formation of a Lewis acid adduc...

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Veröffentlicht in:Chemistry of materials 2019-09, Vol.31 (17), p.6715-6725
Hauptverfasser: Yurash, Brett, Leifert, Dirk, Reddy, G. N. Manjunatha, Cao, David Xi, Biberger, Simon, Brus, Viktor V, Seifrid, Martin, Santiago, Peter J, Köhler, Anna, Chmelka, Bradley F, Bazan, Guillermo C, Nguyen, Thuc-Quyen
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Sprache:eng
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Zusammenfassung:In this report, we investigate the binding properties of the Lewis acid tris­(penta­fluoro­phenyl)­borane with a Lewis base semiconducting polymer, PFPT, and the subsequent mechanism of band gap reduction. Experiments and quantum chemical calculations confirm that the formation of a Lewis acid adduct is energetically favorable (ΔG° < −0.2 eV), with preferential binding at the pyridyl nitrogen in the polymer backbone over other Lewis base sites. Upon adduct formation, ultraviolet photoelectron spectroscopy indicates only a slight decrease in the HOMO energy, implying that a larger reduction in the LUMO energy is primarily responsible for the observed optical band gap narrowing (ΔE opt = 0.3 eV). Herein, we also provide the first spatially resolved picture of how Lewis acid adducts form in heterogeneous, disordered polymer/tris­(pentafluorophenyl)­borane thin films via one- (1D) and two-dimensional (2D) solid-state nuclear magnetic resonance. Notably, solid-state 1D 11B, 13C­{1H}, and 13C­{19F} cross-polarization magic-angle spinning (CP-MAS) NMR and 2D 1H­{19F} and 1H­{1H} correlation NMR analyses establish that BCF molecules are intercalated between branched C16H33 side chains with the boron atom facing toward the pyridyl nitrogen atoms of PFPT.
ISSN:0897-4756
1520-5002
DOI:10.1021/acs.chemmater.9b01224