Record High-Proximity-Induced Anomalous Hall Effect in (Bi x Sb1–x )2Te3 Thin Film Grown on CrGeTe3 Substrate

Quantum anomalous Hall effect (QAHE) can only be realized at extremely low temperatures in magnetically doped topological insulators (TIs) due to limitations inherent with the doping process. In an effort to boost the quantization temperature of QAHE, the magnetic proximity effect in magnetic insula...

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Veröffentlicht in:Nano letters 2019-07, Vol.19 (7), p.4567-4573
Hauptverfasser: Yao, Xiong, Gao, Bin, Han, Myung-Geun, Jain, Deepti, Moon, Jisoo, Kim, Jae Wook, Zhu, Yimei, Cheong, Sang-Wook, Oh, Seongshik
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Sprache:eng
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Zusammenfassung:Quantum anomalous Hall effect (QAHE) can only be realized at extremely low temperatures in magnetically doped topological insulators (TIs) due to limitations inherent with the doping process. In an effort to boost the quantization temperature of QAHE, the magnetic proximity effect in magnetic insulator/TI heterostructures has been extensively investigated. However, the observed anomalous Hall resistance has never been more than several ohms, presumably owing to the interfacial disorders caused by the structural and chemical mismatch. Here, we show that, by growing (Bi x Sb1–x )2Te3 (BST) thin films on structurally and chemically well-matched, ferromagnetic-insulating CrGeTe3 (CGT) substrates, the proximity-induced anomalous Hall resistance can be enhanced by more than an order of magnitude. This sheds light on the importance of structural and chemical matches for magnetic insulator/TI proximity systems.
ISSN:1530-6984
1530-6992
DOI:10.1021/acs.nanolett.9b01495