Thermal adsorption-enhanced atomic layer etching of Si 3 N 4
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| Veröffentlicht in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2018-01, Vol.36 (1) |
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| container_issue | 1 |
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| container_title | Journal of vacuum science & technology. A, Vacuum, surfaces, and films |
| container_volume | 36 |
| creator | Kim, Woo-Hee Sung, Dougyong Oh, Sejin Woo, Jehun Lim, Seungkyu Lee, Hyunju Bent, Stacey F. |
| description | Not provided. |
| doi_str_mv | 10.1116/1.5003271 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0734-2101 |
| ispartof | Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1) |
| issn | 0734-2101 1520-8559 |
| language | eng |
| recordid | cdi_osti_scitechconnect_1541660 |
| source | AIP Journals Complete; Alma/SFX Local Collection |
| subjects | Materials Science Physics |
| title | Thermal adsorption-enhanced atomic layer etching of Si 3 N 4 |
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