Irreversible metal-insulator transition in thin film VO2 induced by soft X-ray irradiation

In this study, we show the ability of soft x-ray irradiation to induce room temperature metal-insulator transitions (MITs) in VO2 thin films grown on R-plane sapphire. The ability of soft x-rays to induce MIT in VO2 thin films is confirmed by photoemission spectroscopy and soft x-ray spectroscopy me...

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Veröffentlicht in:Applied physics letters 2017-12, Vol.111 (24)
Hauptverfasser: Singh, V. R., Jovic, V., Valmianski, I., Ramirez, J. G., Lamoureux, B., Schuller, Ivan K., Smith, K. E.
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Sprache:eng
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Zusammenfassung:In this study, we show the ability of soft x-ray irradiation to induce room temperature metal-insulator transitions (MITs) in VO2 thin films grown on R-plane sapphire. The ability of soft x-rays to induce MIT in VO2 thin films is confirmed by photoemission spectroscopy and soft x-ray spectroscopy measurements. When irradiation was discontinued, the systems do not return to the insulating phase. Analysis of valence band photoemission spectra revealed that the density of states (DOSs) of the V 3d band increased with irradiation time, while the DOS of the O 2p band decreased. We use these results to propose a model in which the MIT is driven by oxygen desorption from thin films during irradiation.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.5012940