Reduction of crack density in ammonothermal bulk GaN growth

The growth of high quality GaN by the ammonothermal method is appealing due to the potential to scale and achieve very high crystal quality. Several applications could benefit from the supply of very high quality GaN such as high power light emitting diodes, laser diodes, and high power electronics....

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Veröffentlicht in:Journal of crystal growth 2016-12, Vol.456 (C), p.27-32
Hauptverfasser: Letts, Edward, Key, Daryl, Hashimoto, Tadao
Format: Artikel
Sprache:eng
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Zusammenfassung:The growth of high quality GaN by the ammonothermal method is appealing due to the potential to scale and achieve very high crystal quality. Several applications could benefit from the supply of very high quality GaN such as high power light emitting diodes, laser diodes, and high power electronics. Despite steady advancement by the few groups developing ammonothermal growth technology, high quality ammonothermal GaN wafers have yet be manufactured in great quantities. This paper reviews the current progress of ammonothermal growth at SixPoint Materials. Growths were performed at T
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2016.08.023