Electronic and transport properties of Li-doped NiO epitaxial thin films

NiO is a p-type wide bandgap semiconductor of use in various electronic devices ranging from solar cells to transparent transistors. Understanding and improving its optical and transport properties have been of considerable interest. In this work, we have investigated the effect of Li doping on the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2018, Vol.6 (9), p.2275-2282
Hauptverfasser: Zhang, J. Y, Li, W. W, Hoye, R. L. Z, MacManus-Driscoll, J. L, Budde, M, Bierwagen, O, Wang, L, Du, Y, Wahila, M. J, Piper, L. F. J, Lee, T.-L, Edwards, H. J, Dhanak, V. R, Zhang, K. H. L
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:NiO is a p-type wide bandgap semiconductor of use in various electronic devices ranging from solar cells to transparent transistors. Understanding and improving its optical and transport properties have been of considerable interest. In this work, we have investigated the effect of Li doping on the electronic, optical and transport properties of NiO epitaxial thin films grown by pulsed laser deposition. We show that Li doping significantly increases the p-type conductivity of NiO, but all the films have relatively low room-temperature mobilities (
ISSN:2050-7526
2050-7534
DOI:10.1039/c7tc05331b