Model based prediction of nanostructured thin film morphology in an aerosol chemical vapor deposition process

[Display omitted] •Model predicting nanostructure formation in an ACVD process is developed.•Process parameter-nanostructure morphology relationship understood.•Model predictions validated experimentally. The aerosol chemical vapor deposition (ACVD) process has been demonstrated as a promising approach to the single step synthesis of nanostructured metal oxide thin films. Multiple process parameters control the nanostructure morphology and the growth of thin films. This work focuses on utilizing a simulation based approach to understand the role of these parameters in governing the morphology of the thin film. A finite element based computational fluid dynamics model, coupled with a discrete-sectional aerosol model, and a boundary layer diffusion and sintering model has been formulated to predict the evolution of particle size distribution and the morphology of the synthesized nanostructured film. The morphology predicted by the model was validated by experimental observations. The model enables scale up and wider application of the ACVD process and can be extended to other gas phase deposition systems.