Rapid and multi-step, patterned electrophoretic deposition of nanocrystals using electrodes covered with dielectric barriers

The rates of electrophoretic deposition (EPD) of CdSe nanocrystals (NCs) are approximately the same when powering electrodes on either the frontside or backside of thick dielectrics when the resistance of the NC colloid exceeds that of the dielectric barrier. Using electrodes with dielectric barriers enables conformal coverage over topography on the frontside. It also enables multistep processing when combined with powering patterned frontside electrodes for localized EPD. Powering patterned backside electrodes produces film features that are wider than the electrode dimensions, which is consistent with the results of modeling the electric field profile.