Sputtered Nb- and Ta-doped TiO2 transparent conducting oxide films on glass

Sputtered Nb- and Ta-doped TiO2 transparent conducting oxide films on glass

Radio frequency (rf) magnetron sputtering is used to deposit Ti0.85Nb0.15O2 and Ti0.8Ta0.2O2 films on glass substrates at substrate temperatures (TS) ranging from ∼250 to 400 °C. The most conducting Nb-doped TiO2 films were deposited at TS = 370 °C, with conductivities of ∼60 S/cm, carrier concentra...

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Veröffentlicht in:Journal of materials research 2007-10, Vol.22 (10), p.2832-2837
Hauptverfasser: Gillispie, Meagen A., van Hest, Maikel F.A.M., Dabney, Matthew S., Perkins, John D., Ginley, David S.
Format: Artikel
Sprache:eng
Schlagworte:
MATERIALS SCIENCE
Optical properties
SOLAR ENERGY
Sputtering
Transparent conductor
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Zusammenfassung:Radio frequency (rf) magnetron sputtering is used to deposit Ti0.85Nb0.15O2 and Ti0.8Ta0.2O2 films on glass substrates at substrate temperatures (TS) ranging from ∼250 to 400 °C. The most conducting Nb-doped TiO2 films were deposited at TS = 370 °C, with conductivities of ∼60 S/cm, carrier concentrations of 1.5 × 1021 cm−3 and mobilities
ISSN:0884-2914
2044-5326
DOI:10.1557/JMR.2007.0353