Solid-state graphene formation via a nickel carbide intermediate phase
Direct formation of graphene with a controlled number of graphitic layers on dielectric surfaces is highly desired for practical applications but still challenging. Distinguished from the conventional chemical vapor deposition methods, a solid-state rapid thermal processing (RTP) method can achieve...
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Veröffentlicht in: | RSC advances 2015-01, Vol.5 (120), p.99037-99043 |
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Hauptverfasser: | , , , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
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Zusammenfassung: | Direct formation of graphene with a controlled number of graphitic layers on dielectric surfaces is highly desired for practical applications but still challenging. Distinguished from the conventional chemical vapor deposition methods, a solid-state rapid thermal processing (RTP) method can achieve high-quality graphene formation on dielectric surfaces without transfer. However, little research is available to elucidate the graphene growth mechanism in the RTP method (heating rate ∼15 °C s
−1
). Here we show a solid-state transformation mechanism in which a metastable nickel carbide (Ni
3
C) intermediate phase plays a critical role in transforming amorphous carbon to two dimensional crystalline graphene and contributing to the autonomous Ni evaporation in the RTP process. The formation, migration and decomposition of Ni
3
C are confirmed to be responsible for graphene formation and Ni evaporation. The Ni
3
C-assisted graphene formation mechanism expands the understanding of Ni-catalyzed graphene formation and provides insightful guidance for controlled growth of graphene through the solid-state transformation process. |
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ISSN: | 2046-2069 2046-2069 |
DOI: | 10.1039/C5RA18682J |