Solid-state graphene formation via a nickel carbide intermediate phase

Direct formation of graphene with a controlled number of graphitic layers on dielectric surfaces is highly desired for practical applications but still challenging. Distinguished from the conventional chemical vapor deposition methods, a solid-state rapid thermal processing (RTP) method can achieve...

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Veröffentlicht in:RSC advances 2015-01, Vol.5 (120), p.99037-99043
Hauptverfasser: Xiong, W., Zhou, Y. S., Hou, W. J., Guillemet, T., Silvain, J. F., Gao, Y., Lahaye, M., Lebraud, E., Xu, S., Wang, X. W., Cullen, D. A., More, K. L., Jiang, L., Lu, Y. F.
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Sprache:eng
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Zusammenfassung:Direct formation of graphene with a controlled number of graphitic layers on dielectric surfaces is highly desired for practical applications but still challenging. Distinguished from the conventional chemical vapor deposition methods, a solid-state rapid thermal processing (RTP) method can achieve high-quality graphene formation on dielectric surfaces without transfer. However, little research is available to elucidate the graphene growth mechanism in the RTP method (heating rate ∼15 °C s −1 ). Here we show a solid-state transformation mechanism in which a metastable nickel carbide (Ni 3 C) intermediate phase plays a critical role in transforming amorphous carbon to two dimensional crystalline graphene and contributing to the autonomous Ni evaporation in the RTP process. The formation, migration and decomposition of Ni 3 C are confirmed to be responsible for graphene formation and Ni evaporation. The Ni 3 C-assisted graphene formation mechanism expands the understanding of Ni-catalyzed graphene formation and provides insightful guidance for controlled growth of graphene through the solid-state transformation process.
ISSN:2046-2069
2046-2069
DOI:10.1039/C5RA18682J