Electron heating in low pressure capacitive discharges revisited

The electrons in capacitively coupled plasmas (CCPs) absorb energy via ohmic heating due to electron-neutral collisions and stochastic heating due to momentum transfer from high voltage moving sheaths. We use Particle-in-Cell (PIC) simulations to explore these heating mechanisms and to compare the P...

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Veröffentlicht in:Physics of plasmas 2014-12, Vol.21 (12)
Hauptverfasser: Kawamura, E., Lieberman, M. A., Lichtenberg, A. J.
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Sprache:eng
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Zusammenfassung:The electrons in capacitively coupled plasmas (CCPs) absorb energy via ohmic heating due to electron-neutral collisions and stochastic heating due to momentum transfer from high voltage moving sheaths. We use Particle-in-Cell (PIC) simulations to explore these heating mechanisms and to compare the PIC results with available theories on ohmic and stochastic heating. The PIC results for ohmic heating show good agreement with the ohmic heating calculation of Lafleur et al. [Phys. Plasmas 20, 124503 (2013)]. The PIC results for stochastic heating in low pressure CCPs with collisionless sheaths show good agreement with the stochastic heating model of Kaganovich et al. [IEEE Trans. Plasma Sci. 34, 696 (2006)], which revises the hard wall asymptotic model of Lieberman [IEEE Trans. Plasma Sci. 16, 638 (1988)] by taking current continuity and bulk oscillation into account.
ISSN:1070-664X
1089-7674
DOI:10.1063/1.4903542