Si⁺-implanted Si-wire waveguide photodetectors for the mid-infrared

CMOS-compatible Si⁺-implanted Si-waveguide p-i-n photodetectors operating at room temperature and at mid-infrared wavelengths from 2.2 to 2.3 µm are demonstrated. Responsivities of 9.9 ± 2.0 mA/W are measured at a 5 V reverse bias with an estimated internal quantum efficiency of 2.7 - 4.5%. The dark...

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Veröffentlicht in:Optics express 2014-11, Vol.22 (22), p.27415-27424
Hauptverfasser: Souhan, Brian, Grote, Richard R, Chen, Christine P, Huang, Hsu-Cheng, Driscoll, Jeffrey B, Lu, Ming, Stein, Aaron, Bakhru, Hassaram, Bergman, Keren, Green, William M J, Osgood, Richard M
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Sprache:eng
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Zusammenfassung:CMOS-compatible Si⁺-implanted Si-waveguide p-i-n photodetectors operating at room temperature and at mid-infrared wavelengths from 2.2 to 2.3 µm are demonstrated. Responsivities of 9.9 ± 2.0 mA/W are measured at a 5 V reverse bias with an estimated internal quantum efficiency of 2.7 - 4.5%. The dark current is found to vary from a few microamps down to less than a nanoamp after a post-implantation annealing of 350°C. The measured photocurrent dependence on input power shows a linear correspondence over more than three decades, and the frequency response of a 250 µm-length p-i-n device is measured to be ~1.7 GHz for a wavelength of λ = 2.2 µm, thus potentially opening up new communication bands for photonic integrated circuits.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.22.027415