Band offsets of La2O3 on (0001) GaN grown by reactive molecular-beam epitaxy

La2O3 films were prepared on (0001)-oriented GaN substrates via reactive molecular-beam epitaxy. Film orientation and phase were assessed using reflection high-energy electron and X-ray diffraction. Films were observed to grow as predominantly hexagonal La2O3 for thicknesses less than 10 nm while fi...

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Veröffentlicht in:Applied physics letters 2013-04, Vol.102 (16)
Hauptverfasser: Ihlefeld, Jon F., Brumbach, Michael, Atcitty, Stanley
Format: Artikel
Sprache:eng
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Zusammenfassung:La2O3 films were prepared on (0001)-oriented GaN substrates via reactive molecular-beam epitaxy. Film orientation and phase were assessed using reflection high-energy electron and X-ray diffraction. Films were observed to grow as predominantly hexagonal La2O3 for thicknesses less than 10 nm while film thickness greater than 10 nm favored mixed cubic and hexagonal symmetries. Band offsets were characterized by X-ray photoelectron spectroscopy on hexagonally symmetric films and valence band offsets of 0.63 ± 0.04 eV at the La2O3/GaN interface were measured. A conduction band offset of approximately 1.5 eV could be inferred from the measured valence band offset.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4803091