In situ x-ray investigation of freestanding nanoscale Cu-Nb multilayers under tensile load

The yield behavior in a freestanding sputter-deposited Cu/Nb multilayer with 30 nm nominal individual layer thickness has been investigated with in situ synchrotron x-ray diffraction during tensile loading. A pronounced elastic-plastic transition is observed with the fraction of plastically yielded...

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Veröffentlicht in:Applied physics letters 2009-01, Vol.94 (3), p.031906-031906-3
Hauptverfasser: Aydıner, C. C., Brown, D. W., Mara, N. A., Almer, J., Misra, A.
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Sprache:eng
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Zusammenfassung:The yield behavior in a freestanding sputter-deposited Cu/Nb multilayer with 30 nm nominal individual layer thickness has been investigated with in situ synchrotron x-ray diffraction during tensile loading. A pronounced elastic-plastic transition is observed with the fraction of plastically yielded grains increasing gradually with strain. Near synchronous yielding is observed in the Cu and Nb grains. The gradual progression in yield behavior is interpreted in terms of residual stresses, and elastic and plastic anisotropy.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3074374