Investigation of Thermal Noise Factor in Nanoscale MOSFETs

In this paper, we investigate the channel thermal noise in nanoscale MOSFETs. Simple analytical model of thermal noise factor in nanoscale MOSFETs is presented and it is verified with accurately measured noise data. The noise factor is expressed in terms of the channel conductance and the electric f...

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Veröffentlicht in:Journal of semiconductor technology and science 2010, 10(3), 39, pp.225-231
Hauptverfasser: Jeon, Jong-Wook, Park, Byung-Gook, Shin, Hyung-Cheol
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Sprache:eng
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Zusammenfassung:In this paper, we investigate the channel thermal noise in nanoscale MOSFETs. Simple analytical model of thermal noise factor in nanoscale MOSFETs is presented and it is verified with accurately measured noise data. The noise factor is expressed in terms of the channel conductance and the electric field in the gradual channel region. The proposed noise model can predict the channel thermal noise behavior in all operating bias regions from the long-channel to nanoscale MOSFETs. From the measurement results, we observed that the thermal noise model for the long-channel MOSFETs does not always underestimate the short-channel thermal noise. KCI Citation Count: 1
ISSN:1598-1657
2233-4866
DOI:10.5573/JSTS.2010.10.3.225