Heat stress causes aberrant DNA methylation of H19 and Igf-2r in mouse blastocysts

To gain a better understanding of the methylation imprinting changes associated with heat stress in early development, we used bisulfite sequencing and bisulfite restriction analysis to examine the DNA methylation status of imprinted genes in early embryos (blastocysts). The paternal imprinted genes...

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Veröffentlicht in:Molecules and cells 2008, 25(2), , pp.211-215
Hauptverfasser: Zhu, Jia-Qiao (Gansu Agricultural University, Gansu, China), Liu, Jing-He (State Key Laboratory of Reproductive Biology, Institute of Zoology, Chinese Academy of Science, Beijing, China), Liang, Xing-Wei (State Key Laboratory of Reproductive Biology, Institute of Zoology, Chinese Academy of Science, Beijing, China), Xu, Bao-Zeng (State Key Laboratory of Reproductive Biology, Institute of Zoology, Chinese Academy of Science, Beijing, China), Hou, Yi (State Key Laboratory of Reproductive Biology, Institute of Zoology, Chinese Academy of Science, Beijing, China), Zhao, Xing-Xu (Gansu Agricultural University, Gansu, China), Sun, Qing-Yuan (State Key Laboratory of Reproductive Biology, Institute of Zoology, Chinese Academy of Science, Beijing, China), E-mail: sunqy1@yahoo.com
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Sprache:eng
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Zusammenfassung:To gain a better understanding of the methylation imprinting changes associated with heat stress in early development, we used bisulfite sequencing and bisulfite restriction analysis to examine the DNA methylation status of imprinted genes in early embryos (blastocysts). The paternal imprinted genes, H19 and Igf-2r, had lower methylation levels in heat-stressed embryos than in control embryos, whereas the maternal imprinted genes, Peg3 and Peg1, had similar methylation pattern in heat-stressed embryos and in control embryos. Our results indicate that heat stress may induce aberrant methylation imprinting, which results in developmental failure of mouse embryos, and that the effects of heat shock on methylation imprinting may be gene-specific.
ISSN:1016-8478
0219-1032
DOI:10.1016/S1016-8478(23)17572-8