VCM을 이용한 리소그래피용 레티클 스테이지의 설계 및 기구학적 해석
This paper presents a design of the reticle stage for lithography using VCM(Voice Coil Motor) and kinematic analysis. The stage has three axes for X,Y,, those actuated by three VCM’s individually. The reticle stage has cross coupled relations between X,Y, axes, and the closed solution of the forward...
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Veröffentlicht in: | 한국생산제조학회지 2008, 17(3), , pp.86-93 |
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Format: | Artikel |
Sprache: | kor |
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Zusammenfassung: | This paper presents a design of the reticle stage for lithography using VCM(Voice Coil Motor) and kinematic analysis. The stage has three axes for X,Y,, those actuated by three VCM’s individually. The reticle stage has cross coupled relations between X,Y, axes, and the closed solution of the forward/inverse kinematics were solved to get an accurate reference position. The reticle stage for lithography was designed for reaching both high accuracy and long stroke, which was 0.1μm (X,Y)/ 1μrad() accuracies and relatively long strokes about 2mm (X,Y) and 2 degrees(). Also this research presents a rotational compensation algorithm for the precision gap sensor for the stage. Simulation results show the overall performance of the whole algorithm and the improvement quantity of the rotational compensation algorithm. KCI Citation Count: 1 |
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ISSN: | 2508-5093 2508-5107 |