습식워터젯을 채용한 초정밀 절삭 가공시스템의 특허동향조사에 관한 연구
Presently, the semiconductor industry has the chronic problem. In the semiconductor industry, it has the semiconductor wafer, a package, the optical filter cut by using the saw blade, the mold, a laser etc. The cutting technique has the difficulty due to the rising of the production cost by the wear...
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Veröffentlicht in: | 한국생산제조학회지 2009, 18(1), , pp.1-12 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | kor |
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Online-Zugang: | Volltext |
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Zusammenfassung: | Presently, the semiconductor industry has the chronic problem. In the semiconductor industry, it has the semiconductor wafer, a package, the optical filter cut by using the saw blade, the mold, a laser etc. The cutting technique has the difficulty due to the rising of the production cost by the wearing of mold, the poor quality problem due to generated heat at the moment of cutting procedure and curve cutting etc. The goal of this time of national research and development project is develop the apparatus for solving the problem that the existing cutting technique has. The technology is so called waterjet abrasive method. This technology will be mainly applied to cut a semiconductor package and a wafer. Two important things to be considered are ripple effect(in other words, the scale of a market) and simplicity of an application. KCI Citation Count: 0 |
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ISSN: | 2508-5093 2508-5107 |