U-shaped Reconfigurable Field-effect Transistor

We propose a novel reconfigurable field-effect transistor (RFET) featuring two vertically-stacked gates and a U-shaped nanowire channel. Conventional RFETs have a relatively large unit cell size due to their configuration with multiple gates. However, the proposed device can solve this inherent disa...

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Veröffentlicht in:Journal of semiconductor technology and science 2019, 19(1), 85, pp.63-68
Hauptverfasser: Wee, Daehoon, Kwon, Hui Tae, Lee, Won Joo, Choi, Hyun-Seok, Park, Yu Jeong, Kim, Boram, Kim, Yoon
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Sprache:eng
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Zusammenfassung:We propose a novel reconfigurable field-effect transistor (RFET) featuring two vertically-stacked gates and a U-shaped nanowire channel. Conventional RFETs have a relatively large unit cell size due to their configuration with multiple gates. However, the proposed device can solve this inherent disadvantage of RFET. In addition, it can have a long enough channel without additional area, so that excellent characteristics can be obtained without the short channel effects. The characteristics of the proposed device were examined by 3-D technology computer-aided design (TCAD) device simulation. The effect of some device parameters on the device performance were investigated. Also, the fabrication method is proposed. KCI Citation Count: 0
ISSN:1598-1657
2233-4866
DOI:10.5573/JSTS.2019.19.1.063