전해에칭 보호 마스크로 활용하기 위한 도금층의 레이저 패터닝

A through-mask electrochemical etching process involves a selective metal removal process from unprotected areas of a patterned workpiece. A protective mask such as a photo-mask is used in through-mask electrochemical etching. The deposited layer with micro patterns can be fabricated by laser beam irradiation. The deposited layer with micro patterns can act as a protective mask during electrochemical etching. The characteristics of deposited layer with micro patterns are investigated according to the electrodeposition and laser beam conditions. The experimental results were observed by SEM (scanning electron microscope), EDS (energy dispersive spectrometry), and surface profile analysis. Consequently, selective electrochemical etching using the deposited layer was successfully achieved.