DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 NbN 코팅막의 물성 비교연구

The paper presents the comparative results of NbN coatings deposited by DC and pulsed DC asymmetric bipolar magnetron sputtering systems. The results show that, with the decreasing duty cycle and increasing pulse frequency, the coating morphology changes from a columnar to a dense structure, with fi...

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Veröffentlicht in:Biuletyn Uniejowski 2015, 48(4), , pp.136-141
Hauptverfasser: 전성용(Sung-Yong Chun), 오복현(Bok-Hyun Oh)
Format: Artikel
Sprache:kor
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Zusammenfassung:The paper presents the comparative results of NbN coatings deposited by DC and pulsed DC asymmetric bipolar magnetron sputtering systems. The results show that, with the decreasing duty cycle and increasing pulse frequency, the coating morphology changes from a columnar to a dense structure, with finer grains. The Pulsed sputtered NbN coatings showed higher hardness, higher residual stress, and smaller grain sizes than those of DC prepared NbN coatings. Moreover residual stress of pulsed sputtered NbN coatings increased on increasing pulse frequency. Meanwhile, the surface roughness decreased continuously with increasing pulsed DC frequency up to 50 kHz.
ISSN:1225-8024
2299-8403
2288-8403
DOI:10.5695/JKISE.2015.48.4.136