Scaling Rules for Multi-Finger Structures of 0.1-μm Metamorphic High-Electron-Mobility Transistors
We examined the scaling effects of a number of gate_fingers (N) and gate_widths (w) on the high-frequency characteristics of 0.1-μm metamorphic high-electron-mobility transistors. Functional relationships of the extracted small-signal parameters with total gate widths (wt) of different N were propos...
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Veröffentlicht in: | Journal of Electromagnetic Engineering and Science 2013, 13(2), , pp.127-133 |
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Sprache: | eng |
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Zusammenfassung: | We examined the scaling effects of a number of gate_fingers (N) and gate_widths (w) on the high-frequency characteristics of 0.1-μm metamorphic high-electron-mobility transistors. Functional relationships of the extracted small-signal parameters with total gate widths (wt) of different N were proposed. The cut-off frequency (fT) showed an almost independent relationship with wt; however, the maximum frequency of oscillation (fmax) exhibited a strong functional relationship of gate-resistance (Rg) influenced by both N and wt. A greater wt produced a higher fmax; but, to maximize fmax at a given wt, to increase N was more efficient than to increase the single gate_width. KCI Citation Count: 0 |
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ISSN: | 2234-8409 2671-7255 2671-7263 |
DOI: | 10.5515/JKIEES.2013.13.2.127 |