Photoluminescence Study on Crystalline Silicon Single Quantum Wells
Crystalline silicon (c-Si) single quantum wells with the structure of SiO2/c-Si/SiO2 are fabri- cated by high-temperature thermal oxidation of silicon-on-insulator wafers and are studied by using photoluminescence (PL) measurements at room temperature. Four emission peaks are observed around 1.8, 2....
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Veröffentlicht in: | Journal of the Korean Physical Society 2006, 48(5I), , pp.974-977 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Crystalline silicon (c-Si) single quantum wells with the structure of SiO2/c-Si/SiO2 are fabri-
cated by high-temperature thermal oxidation of silicon-on-insulator wafers and are studied by using
photoluminescence (PL) measurements at room temperature. Four emission peaks are observed
around 1.8, 2.3, 2.7, and 3.0 eV. The PL peak near 2.3 eV shows a clear blueshift, the magnitude
of which depends on the thickness of the top SiO2 layer as the thickness of the c-Si layer shrinks
to zero. The PL peaks observed from this structure are not related with the quantum con.nement
eects; rather, they come from the SiO2 layers or the interface region between the c-Si and the
SiO2 layers.f KCI Citation Count: 1 |
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ISSN: | 0374-4884 1976-8524 |