Determination of the parameters for the back-to-back switched Schottky barrier structures
The Cr/ n-GaAs/Cr and Ag/ p-GaAs/Ag metal–semiconductor–metal (MSM) Schottky contacts have been fabricated by reactive radio frequency (RF) sputtering system. The current–voltage ( I – V ) and capacitance–voltage ( C – V ) characteristics of the devices have been investigated in the temperature rang...
Gespeichert in:
Veröffentlicht in: | Current applied physics 2010, 10(2), , pp.652-654 |
---|---|
Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The Cr/
n-GaAs/Cr and Ag/
p-GaAs/Ag metal–semiconductor–metal (MSM) Schottky contacts have been fabricated by reactive radio frequency (RF) sputtering system. The current–voltage
(
I
–
V
)
and capacitance–voltage
(
C
–
V
)
characteristics of the devices have been investigated in the temperature range of 80–316
K for the back-to-back switched Schottky barrier contacts. These measurements establish that the room temperature barrier height determined from reverse branch of the current–voltage characteristics is close to the value obtained from capacitance–voltage measurements. |
---|---|
ISSN: | 1567-1739 1878-1675 |
DOI: | 10.1016/j.cap.2009.08.012 |